Thin-film Materials
Sputtering Targets
- By using more than 50 chemical elements, XALLOY is experienced in manufacturing sputtering targets made from over 3,000 alloys and 30 types of metal oxides.
- XALLOY provides sputtering targets for industries such as semiconductors and electronic components. Depending on the application, we can provide sputtering targets in various shapes and sizes.
- XALLOY can customize products to meet various specifications.
XALLOY's semiconductor-grade sputtering targets are supplied to wafer foundries, bumping and packaging/testing processes. Our products feature both high purity and high precision microstructure, had certifiede by major international companies.
| Application | Products |
|---|---|
| Interconnection layer | Cu, CuAl and CuMn sputtering targets |
| Electrode/Metallization layer | Au, Ag, Pt, Ti sputtering targets |
| Barrier layer | Ta, Ti, WTi, NiV sputtering targets |
| Gate Electrode | NiPt alloy targets |
| Next Generation Non-volatile Memory | Ru, Pt, Ta, FeCo alloy targets |
XALLOY supplies sputtering targets for the manufacturing of various electronic components, including passive components, crystal oscillators, and ceramic substrates. According to customers’ specific requirements, we can design target compositions and apply suitable production processes to deliver maximum value.
| Application | Product |
|---|---|
| Thin Film Resistance Material | Ni alloy, Cr alloy, Cu alloy, Ta sputtering targets |
| Thin Film Inductance Material | Soft magnetic alloy sputtering targets |
| Crystal Oscillator Electrode Material | Au, Ni, Cr, Ag alloy sputtering targets |
| Ceramic Substrate Circuit Material | Cu, Ti sputtering targets |
| Customized Functional Material | Pure metal, metal alloy or ceramic sputtering targets |
With the capability in material design and process development, we can offer customized service to meet your requirements.
- Gold target have passed ISO 10993-5 medical devices vitro cytotoxicity of biocompatibility test.
